Author:
Liu Qingwei,Cheng Renqiang,Zhang Liguo
Cited by
12 articles.
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1. On the origin and evolution of hotspots in multipatterning processes;Journal of Vacuum Science & Technology B;2023-06-06
2. OPC accuracy improvement through deep-learning based etch model;Advanced Etch Technology and Process Integration for Nanopatterning XI;2022-05-25
3. Machine Learning for Mask Synthesis;Machine Learning in VLSI Computer-Aided Design;2019
4. Introducing etch kernels for efficient pattern sampling and etch bias prediction;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-03-06
5. Pattern sampling for etch model calibration;33rd European Mask and Lithography Conference;2017-09-28