Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage-Reference-Cited by-同舟云学术

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Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage

Published:2008-10-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Photomask Technology 2008
language:
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Author:

Helbig Stefan,Urban Sabine,Klein Elizabeth,Singh Sherjang

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. In-situ cavitation measurements with a wireless sensor array: applications in megasonic photomask cleaning;Photomask Technology 2022;2022-12-01

2. Dissolution Amplification by Resonance and Cavitational Stimulation at Ultrasonic and Megasonic Frequencies;The Journal of Physical Chemistry C;2022-02-09

3. Damage-Free Cleaning of Advanced Structure Using Timely Energized Bubble Oscillation Megasonic Technology;Solid State Phenomena;2018-08

4. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017

5. Enhancing acoustic cavitation using artificial crevice bubbles;Ultrasonics;2015-02

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