Author:
Candia Nicolas,Zanelli Claudio,Han Zhenxing,Yam Petrie
Reference11 articles.
1. Megasonic Cleaning for Particle Removal;Keswani,2015
2. The International Technology Roadmap for Semiconductors (ITRS) for Lithography 2013 Edition, Tables LITH3 and LITH4, Semiconductor Industry Association, Washington, DC (2013).
3. Impact of MegaSonic process conditions on PRE and sub-resolution assist feature damage
4. ROLES OF CAVITATION AND ACOUSTIC STREAMING IN MEGASONIC CLEANING
5. Mechanism of particle removal by megasonic waves