Mask induced polarization effects at high NA-Reference-Cited by-同舟云学术

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Mask induced polarization effects at high NA

Published:2005-05-12 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XVIII
language:
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Author:

Estroff Andrew,Fan Yongfa,Bourov Anatoly,Smith Bruce,Foubert Philippe,Leunissen L. H.,Philipsen Vicky,Aksenov Yuri

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Simulation study on EUV multilayer polarization effects;Computational Optics 2021;2021-09-21

2. Mechanical stress birefringence of optical plates;Applied Optics;2020-08-20

3. Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-11

4. Binary mask side lobe suppression using space scattering bar;Microelectronic Engineering;2007-05

5. Polarization aberrations in hyper-numerical-aperture projection printing: a comparison of various representations;Journal of Micro/Nanolithography, MEMS, and MOEMS;2006-07-01

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