Binary mask side lobe suppression using space scattering bar-Reference-Cited by-同舟云学术

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Binary mask side lobe suppression using space scattering bar

Published:2007-05 Issue:5-8 Volume:84 Page:755-760
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Suh Sungsoo,Lee Sukjoo,Back Kyoung-yoon,Lee Sungwoo,Kim Youngchang,Kim Sangwook,Cho Hanku

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Effect of pattern density for contact windows in an attenuated phase shift mask

2. Attenuated phase-shift masks reducing side-lobe effect in DRAM peripheral circuit region

3. Mask induced polarization effects at high NA

4. Determination of mask-induced polarization effects occurring in hyper NA immersion lithography

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