Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography-Reference-Cited by-同舟云学术

Multilayer lift-off process for sub-15-nm patterning by step-and-repeat ultraviolet nanoimprint lithography

Published:2014-09-05 Issue:3 Volume:13 Page:033013
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Calafiore Giuseppe¹,Dhuey Scott²,Sassolini Simone²,Alayo Nerea³,Gosselin David²,Vogler Marko⁴,Olynick Deirdre²,Peroz Christophe¹,Cabrini Stefano²

Affiliation:

1. aBeam Technologies Inc., 22290 Foothill Boulevard, Suite 2, Hayward, California 94541, United States

2. Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States

3. Instituto de Microelectronica de Barcelona Campus UAB, Bellaterra, Barcelona 08193, Spain

4. Micro Resist Technology, Kopenicker Street 325, Berlin D-12555, Germany

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices

2. Development and advantages of step-and-flash lithography;Colburn,2001

3. Single digit nanofabrication by step-and-repeat nanoimprint lithography

4. Metallic nanostructured materials based sensors

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