Reflective grazing incidence EUV nanoscope for wafer metrology-Reference-Cited by-同舟云学术

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Reflective grazing incidence EUV nanoscope for wafer metrology

Published:2022-12-01 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2022
language:
Short-container-title:

Author:

Shen Tao,Ekinci Yasin,Mochi Iacopo

Publisher

SPIE

Reference12 articles.

1. The Role Of Metrology And Inspection In Semiconductor Processing

2. Metrology for the next generation of semiconductor devices

3. Metrology and Diagnostic Techniques for Nanoelectronics

4. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

5. Determination of optical constants of thin films in the EUV

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-12

2. EUV reflectometry and scatterometry for thin layer and periodic structure characterization;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. EUV reflective coherent diffraction imaging system for wafer metrology;Optical Measurement Systems for Industrial Inspection XIII;2023-08-15

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