Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography

Published:2009-10-01 Issue:4 Volume:8 Page:041502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

George Simi A.

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Extreme ultraviolet lithography

2. V. Bakshi , Ed.,EUV Sources for Lithography, SPIE Press, Bellinghan WA (2005).

3. A. Miyake, H. Kanazawa, V. Banine, and K. Suzuki , “Joint requirements,”Sematech EUV Workshop Proc., Barcelona, Spain (Oct. 19, 2006).

4. P. Kürz , “The EUV optics development program at carl zeiss SMT AG,” see http://www.sematech.org/meetings/archives/litho/euvl/20030930/presentations/8A%20P%20Kurz%20EUV%20Symp.pdf (2003).

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