Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure-Reference-Cited by-同舟云学术

Unraveling the role of secondary electrons upon their interaction with photoresist during EUV exposure

Published:2017-10-16 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2017
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Author:

Pollentier Ivan,Vesters Yannick,Jiang Jing,Vanelderen Pieter,De Simone Danilo

Publisher

SPIE

Reference5 articles.

1. Radiation Chemistry in Chemically Amplified Resists

2. Materials and Processes for Next Generation Lithography - Theory : electron-induced chemistry;Van Dorp,2016

3. Relationship between resist related outgassing and witness sample contamination in the NXE outgas qualification using electrons and photons;Pollentier,2013

4. Cross sections of photoacid generators at low electron energies

5. Polymer photochemistry at the EUV wavelength;Fedynyshyn,2010

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