0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography-Reference-Cited by-同舟云学术

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0.1-nanometer resolution positioning stage for sub-10 nm scanning probe lithography

Published:2013-03-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies V
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Author:

Vorbringer-Doroshovets Nataliya,Balzer Felix,Fuessl Roland,Manske Eberhard,Kaestner Marcus,Schuh Andreas,Zoellner Jens-Peter,Hofer Hofer,Guliyev Elshad,Ahmad Ahmad,Ivanov Tzvetan,Rangelow Ivo W.

Publisher

SPIE

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Discrete Input-Output Sliding-Mode Control with Range Compensation: Application in High-Speed Nanopositioning;2022 American Control Conference (ACC);2022-06-08

3. Scanning probe lithography on calixarene towards single-digit nanometer fabrication;International Journal of Extreme Manufacturing;2020-08-04

4. Cryogenic etching for pattern transfer into silicon of Mix-and-Match structured resist layers;Microelectronic Engineering;2020-04

5. Micro- and nanofabrication technologies using the nanopositioning and nanomeasuring machines;Optical Measurement Systems for Industrial Inspection XI;2019-06-21

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