Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source-Reference-Cited by-同舟云学术

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Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source

Published:2011-03-17 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Yanagida Tatsuya,Nagano Hitoshi,Wada Yasunori,Yabu Takayuki,Nagai Shinji,Soumagne Georg,Hori Tsukasa,Kakizaki Kouji,Sumitani Akira,Fujimoto Junichi,Mizoguchi Hakaru,Endo Akira

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Molecular dynamics study on nanodust removal strategies from nanotrench structures;International Journal of Mechanical Sciences;2024-09

2. Experimental investigation of the mask diffraction light blocking with critical-sized Sn particles on the EUV pellicle;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

3. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

4. Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements;Japanese Journal of Applied Physics;2022-04-22

5. Update of Development Progress of the High Power LPP-EUV Light Source Using a Magnetic Field;Journal of Photopolymer Science and Technology;2020-07-01

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