Gold damascene interconnect technology for millimeter-wave photonics on silicon
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SPIE
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Abrasive-free chemical-mechanical planarization (CMP) of gold for thin film nano-patterning;Nanoscale;2024
2. Interface and Reliability Analysis of Au-Passivated Cu–Cu Fine-Pitch Thermocompression Bonding for 3-D IC Applications;IEEE Transactions on Components, Packaging and Manufacturing Technology;2019-07
3. Fabrication of top-down gold nanostructures using a damascene process;Microelectronic Engineering;2017-06
4. Chemical mechanical planarization of gold;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2014-03
5. Preparation of sacrificial layer for MEMS devices by lift-off technology;Microsystem Technologies;2013-10-30
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