Author:
Eggenstein F.,Bischoff P.,Gaupp A.,Senf F.,Sokolov A.,Zeschke T.,Schäfers F.
Reference19 articles.
1. Characterization of the PTB EUV reflectometry facility for large EUVL optical components;Tümmler,2003
2. High accuracy EUV reflectometry at large optical components and oblique incidence;Laubis,2009
3. High-resolution, high-flux, user friendly VLS beamline at the ALS for the 50–1300eV energy region
4. Recent Developments in EUV Reflectometry at the Advanced Light Source;Gullikson,2001
5. Sub-nm accuracy metrology for ultra-precise reflective X-ray optics
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