Author:
Golde Daniel,Butscher Björn,Gräupner Paul,Kürz Peter,Jürgens Dirk,Conradi Olaf,van Schoot Jan,Stoeldraijer Judon
Reference11 articles.
1. 0.33 NA EUV systems for high-volume manufacturing
2. Where Is The Lost Resolution?
3. High-NA EUV imaging: challenges and outlook
4. Imaging performance of EUV lithography optics configuration for sub-9nm resolution;Neumann,2015
5. EUV lithography optics for sub 9nm resolution;Migura,2014