Where Is The Lost Resolution?

Author:

Lin Burn J.1

Affiliation:

1. IBM General Technology Division (United States)

Publisher

SPIE

Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. EUV optics at ZEISS: status, outlook, and future;Optical and EUV Nanolithography XXXVII;2024-04-10

2. The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades;IEEE Electron Devices Magazine;2024-03

3. Beyond the diffraction limit with a quantum confinement effect (QCE) image sensor;Journal of the Optical Society of America B;2024-02-02

4. Emergence of next generation EUV optics: status, outlook and future;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05

5. EUV optics at ZEISS: status and outlook;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01

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