Rule-based OPC and MPC interaction for implant layers-Reference-Cited by-同舟云学术

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Rule-based OPC and MPC interaction for implant layers

Published:2015-10-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Fu Nan,Ning Guoxiang,Werle Florian,Roling Stefan,Hecker Sandra,Ackmann Paul,Buergel Christian

Publisher

SPIE

Reference3 articles.

1. Stack effect implementation in OPC and mask verification for production environment;Sungauer,2012

2. Wafer Sub-Layer Impact In OPC/ORC Models For 2x nm Node Implant Layers;Le-Denmata,2013

3. Model based OPC for implant layer patterning considering wafer topography proximity (W3D) effects“;Park,2012

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. MPC simplification for established model-based mask process correction solutions;Photomask Technology 2019;2019-09-26

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