Scanning coherent diffractive imaging methods for actinic EUV mask metrology-Reference-Cited by-同舟云学术

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Scanning coherent diffractive imaging methods for actinic EUV mask metrology

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Helfenstein Patrick¹,Mohacsi Istvan¹,Rajendran Rajeev¹,Ekinci Yasin¹

Affiliation:

1. Paul Scherrer Institute (Switzerland)

Publisher

SPIE

Reference16 articles.

1. Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

2. A novel method for utilizing AIMS™ to evaluate mask repair and quantify over-repair or under-repair condition;Uzzel,2013

3. Commissioning an EUV mask microscope for lithography generations reaching 8 nm;Goldberg,2013

4. Actinic imaging of native and programmed defects on a full-field mask;Mochi,2010

5. Wavelength-Specific Reflections: A Decade of EUV Mask Inspection Research;Goldberg,2009

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-fidelity ptychographic imaging of highly periodic structures enabled by vortex high harmonic beams;Optica;2023-09-20

2. Reliability of ptychography on periodic structures;OSA Continuum;2020-06-14

3. Performance of Extreme Ultraviolet Coherent Scattering Microscope;Journal of Nanoscience and Nanotechnology;2019-10-01

4. RESCAN: an actinic lensless microscope for defect inspection of EUV reticles;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-07-27

5. Scanning coherent scattering methods for actinic EUV mask inspection;SPIE Proceedings;2016-10-05

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