Phase-shifting effect of thin-absorber EUV masks-Reference-Cited by-同舟云学术

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Phase-shifting effect of thin-absorber EUV masks

Published:2011-10-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Tanabe Hiroyoshi,Murachi Tetsunori,Lee Sang H.,Chandhok Manish,Park Seh-Jin,Zhang Guojing,Abe Tsukasa,Ogase Taichi,Hayashi Naoya

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11

2. Classification of EUV masks based on the ratio of the complex refractive index k/(1-n);International Conference on Extreme Ultraviolet Lithography 2021;2021-10-12

3. At wavelength coherent scatterometry microscope using high-order harmonics for EUV mask inspection;International Journal of Extreme Manufacturing;2019-09-04

4. Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-11

5. Attenuated PSM for EUV: Can they mitigate 3D mask effects?;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19

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