Image-based pupil plane characterization for anamorphic lithography systems-Reference-Cited by-同舟云学术

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Image-based pupil plane characterization for anamorphic lithography systems

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Levinson Zac¹,Smith Bruce W.¹

Affiliation:

1. Rochester Institute of Technology (United States)

Publisher

SPIE

Reference25 articles.

1. Microlithography

2. Study of angular effects for optical systems into the EUV;Burbine,2014

3. Anamorphic high-NA EUV lithography optics;Migura,2015

4. Imaging performance of the EUV high NA anamorphic system;van Ingen Schenau,2015

5. The Diffraction Theory of Aberrations;Nijboer,1942

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1. Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-04-21

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