1. Scatterometry measurement precision and accuracy below 70 nm;Sendelbach,2003
2. Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis;Sendelbach,2004
3. Inline CD metrology with combined use of scatterometry and CD-SEM;Asano,2006
4. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM;Vaid,2011
5. Characterization of cross sectional profile of nanostructure line grating using small angle x-ray scattering;Ishibashi,2010