Extending lithography with advanced materials-Reference-Cited by-同舟云学术

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Extending lithography with advanced materials

Published:2014-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Guerrero Douglas J.

Publisher

SPIE

Reference30 articles.

1. Anti-interference phenomena coating;Khoury,1970

2. Nonreflecting Photoresist Process;DiPiazza,1978

3. Bilevel high resolution photolithographic technique for use with wafers with stepped and/or reflecting surfaces

4. Linewidth control in projection lithography using a multilayer resist process;O’Toole,1981

5. The reduction of standing-wave effect in positive photoresist;Brewer,1981

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Novel Fast Etch Rate BARC for ArF Implant Layer Lithography;Journal of Photopolymer Science and Technology;2019-06-24

2. LWR enhancement for 300mm track processing;Advances in Patterning Materials and Processes XXXV;2018-03-13

3. Application of natural linear polysaccharide to green resist polymers for electron beam and extreme-ultraviolet lithography;Japanese Journal of Applied Physics;2014-10-30

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