Polydimethylglutarimide (PMGI) Resist - A Progress Report-Reference-Cited by-同舟云学术

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Polydimethylglutarimide (PMGI) Resist - A Progress Report

Published:1986-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing III
language:
Short-container-title:

Author:

McCullough A W.¹,Vidusek D. A.¹,Legenza M. W.¹,de Grandpre M.²,Imhof J.²

Affiliation:

1. Shipley Company Inc. (United States)

2. Rohm and Haas Company (United States)

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Lithographically-generated 3D lamella layers and their structural color;Nanoscale;2016

2. Isopropanol/water as a developer for poly(dimethylglutarimide);Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-10-01

3. Exposure and development of thick polydimethylglutarimide films for MEMS applications using 254-nm irradiation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-04-01

4. New portable conformable masking excimer laser lithography using water-soluble contrast enhanced material;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-01

5. Additive Processes;Semiconductor Lithography;1988

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