Polydimethylglutarimide (PMGI) Resist - A Progress Report

Author:

McCullough A W.1,Vidusek D. A.1,Legenza M. W.1,de Grandpre M.2,Imhof J.2

Affiliation:

1. Shipley Company Inc. (United States)

2. Rohm and Haas Company (United States)

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Lithographically-generated 3D lamella layers and their structural color;Nanoscale;2016

2. Isopropanol/water as a developer for poly(dimethylglutarimide);Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-10-01

3. Exposure and development of thick polydimethylglutarimide films for MEMS applications using 254-nm irradiation;Journal of Micro/Nanolithography, MEMS, and MOEMS;2008-04-01

4. New portable conformable masking excimer laser lithography using water-soluble contrast enhanced material;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-01

5. Additive Processes;Semiconductor Lithography;1988

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