New portable conformable masking excimer laser lithography using water-soluble contrast enhanced material
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Published:1988-01
Issue:1
Volume:6
Page:87
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. Two-layer resist fabrication by new portable conformable masking i-line lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1989-01
2. Tunneling Spectroscopy and III-V Semiconductor Interfaces;Point and Extended Defects in Semiconductors;1989