Author:
Erdmann Andreas,Fuehner Tim,Evanschitzky Peter,Neumann Jens Timo,Ruoff Johannes,Graeupner Paul
Cited by
20 articles.
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1. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11
2. 先进计算光刻;Laser & Optoelectronics Progress;2022
3. Study of novel EUVL mask absorber candidates;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-03
4. Mask absorber for next generation EUV lithography;Extreme Ultraviolet Lithography 2020;2020-10-20
5. Perspectives and tradeoffs of absorber materials for high NA EUV lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-10-01