Author:
Erdmann Andreas,Fuehner Tim,Evanschitzky Peter,Neumann Jens Timo,Ruoff Johannes,Graeupner Paul
Cited by
22 articles.
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1. Genetic optimization of aperiodic multilayer masks for high and hyper-NA EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10
2. 极紫外光栅波导中TE0模式有效折射率分析;Chinese Journal of Lasers;2024
3. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11
4. 先进计算光刻;Laser & Optoelectronics Progress;2022
5. Study of novel EUVL mask absorber candidates;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-05-03