Electron beam mask writer EBM-9500 for logic 7nm node generation-Reference-Cited by-同舟云学术

Electron beam mask writer EBM-9500 for logic 7nm node generation

Published:2016-10-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Matsui Hideki¹,Kamikubo Takashi¹,Nakahashi Satoshi¹,Nomura Haruyuki¹,Nakayamada Noriaki¹,Suganuma Mizuna¹,Kato Yasuo¹,Yashima Jun¹,Katsap Victor²,Saito Kenichi¹,Kobayashi Ryoei¹,Miyamoto Nobuo¹,Ogasawara Munehiro¹

Affiliation:

1. NuFlare Technology, Inc. (Japan)

2. NuFlare Technology, Inc. (United States)

Publisher

SPIE

Reference10 articles.

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