Model-based correction for local stress-induced overlay errors-Reference-Cited by-同舟云学术

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Model-based correction for local stress-induced overlay errors

Published:2018-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXI
language:
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Author:

Stobert Ian,Stiffler Scott,Shi Hongbo,Krishnamurthy Subramanian

Publisher

SPIE

Reference15 articles.

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2. IBM Power9 Processor Architecture

3. POWER9™: A processor family optimized for cognitive computing with 25Gb/s accelerator links and 16Gb/s PCIe Gen4.;Gonzalez,2017

4. POWER9: Processor for the cognitive era.;Thompto,2016

5. Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes

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1. Predictive compact model for stress-induced on-product overlay correction;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-10-13

2. IBM z15: Physical design improvements to significantly increase content in the same technology;IBM Journal of Research and Development;2020-09

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