Author:
Mehta Sohan S.,Ganta Lakshmi K.,Chauhan Vikrant,Wu Yixu,Singh Sunil,Ann Chia,Subramany Lokesh,Higgins Craig,Erenturk Burcin,Srivastava Ravi,Singh Paramjit,Koh Hui Peng,Cho David
Reference6 articles.
1. Timing Yield-Aware Color Reassignment and Detailed Placement Perturbation for Bimodal CD Distribution in Double Patterning Lithography
2. Xiaoping Tang; Minsik Cho, “Optimal layout decomposition for double patterning technology,” Computer-Aided Design (ICCAD), 2011 IEEE/ACM International Conference on, vol., no., pp.9, 13, 7-10 Nov. 2011
3. Seong-I Lei; Chu, C.; Wai-Kei Mak, “Double patterning-aware detailed routing with mask usage balancing,” Quality Electronic Design (ISQED), 2014 15th International Symposium on, vol., no., pp.219,223, 3-5 March 2014
4. Investigation of trench and contact hole shrink mechanism in the negative tone develop process
5. Lithographic importance of acid diffusion in chemically amplified resists;Steenwinckel,2005
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献