1. Defect metrology challenges at the 11nm node and beyond;Crimmins,2010
2. E-beam Inspection for Gap Physical Defect Detection in 28nm CMOS Process;Chen,2013
3. Native pattern defect inspection of EUV mask using advanced electron beam inspection system;Shimomura,2010
4. Study of Program Defects of 22nm Nano Imprint Template with an Advanced e-beam Inspection System;Hiraka,2009
5. Study of Devices Leakage of 45nm node with Different SRAM Layouts Using an Advanced ebeam Inspection Systems;Xiao,2009