Contour based metrology: “make measurable what is not so"-Reference-Cited by-同舟云学术

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Contour based metrology: “make measurable what is not so"

Published:2020-03-27 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control for Microlithography XXXIV
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Author:

Le-Gratiet Bertrand,Bouyssou Regis,Ducote Julien,Ostrovsky Alain,Beylier Charlotte,Gardin Christian,Schuch Nivea G.,Annezo Vincent,Schneider Loïc,Millequant Matthieu,Petroni Paolo,Figueiro Thiago,Schiavone Patrick

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Self-supervised deep learning neural network for CD-SEM image denoising using reduced dataset;Metrology, Inspection, and Process Control XXXVII;2023-04-27

2. Characterization of mask CD mean-to-target for hotspot patterns by using SEM image contours and feed forward intra CDU by mask MTT;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

3. Contour based process characterization and modeling for HVM;2022 International Workshop on Advanced Patterning Solutions (IWAPS);2022-10-21

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