Fast annealing DSA materials designed for sub-5 nm resolution
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SPIE
Reference15 articles.
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1. Synthesis of Ordered Fluorinated BCPs with One Block Composed of Random Copolymer;Journal of Photopolymer Science and Technology;2021-06-11
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3. Block copolymers with a fluoro-block for 5 nm DSA patterning application;Advances in Patterning Materials and Processes XXXVII;2020-03-23
4. Synthesis of a Fluoromethacrylate Hydroxystyrene Block Copolymer Capable of Rapidly Forming Sub-5 nm Domains at Low Temperatures;ACS Macro Letters;2019-03-20
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