<title>Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

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Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

Published:1991-06-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing VIII
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Author:

Hanabata Makoto,Oi F.,Furuta Akihiro

Publisher

SPIE

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H₂/O₂ Mixtures Activated on a Tungsten Hot-wire Catalyst;Journal of Photopolymer Science and Technology;2021-06-11

2. Effect of initial molecular weight distribution on pattern formation of main-chain-scission-type resists;Japanese Journal of Applied Physics;2021-04-20

3. Enhancing the Novolak resin resist resolution by adding phenol to fractionated resin;SPIE Proceedings;2016-03-25

4. Novel one-component positive-tone chemically amplified i-line molecular glass photoresist based on tannic acid;Chemical Research in Chinese Universities;2015-07-10

5. Development and Application of Microelectronic Photoresist;PROG CHEM;2014

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