Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool-Reference-Cited by-同舟云学术

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Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Suzuki Toru,Kakizaki Kouji,Matsunaga Takashi,Tanaka Satoshi,Kawasuji Yasufumi,Shimbori Masashi,Yoshino Masaya,Kumazaki Takahito,Umeda Hiroshi,Nagano Hitoshi,Nagai Shinji,Sasaki Youichi,Mizoguchi Hakaru

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography;SPIE Proceedings;2015-03-18

2. Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography;SPIE Proceedings;2013-04-12

3. High-range laser bandwidth tuning for focus drilling;SPIE Proceedings;2011-09-22

4. Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography;SPIE Proceedings;2011-03-17

5. Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography;SPIE Proceedings;2010-03-11

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