Impact of an etched EUV mask black border on imaging and overlay
Author:
Affiliation:
1. ASML Netherlands B.V. (Netherlands)
2. Toppan Printing Co., Ltd. (Japan)
3. IMEC (Belgium)
4. Toppan Photomasks, Inc. (Germany)
5. ASML Wilton (United States)
Publisher
SPIE
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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3. Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility;Photomask Technology 2019;2019-09-26
4. EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12
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