Impact of an etched EUV mask black border on imaging: part II-Reference-Cited by-同舟云学术

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Impact of an etched EUV mask black border on imaging: part II

Published:2013-10-03 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Davydova Natalia,de Kruif Robert,Morimoto Hiroaki,Sakata Yo,Kotani Jun,Fukugami Norihito,Kondo Shinpei,Imoto Tomohiro,Connolly Brid,van Gestel Dries,Oorschot Dorothe,Rio David,Zimmerman John,Harned Noreen

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. OPC and modeling solution towards 0.55NA EUV stitching;Optical and EUV Nanolithography XXXVII;2024-04-10

2. High-power EUV lithography: spectral purity and imaging performance;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-09-22

3. EUV mask with advanced hybrid black border suppressing EUV and DUV OOB light reflection;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12

4. Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-07

5. Novel EUV mask black border suppressing EUV and DUV OoB light reflection;SPIE Proceedings;2016-05-10

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