Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists-Reference-Cited by-同舟云学术

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Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Published:2005-05-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Nagahara Seiji,Yuan Lei,Poppe Wojtek Jacob,Neureuther Andrew,Kono Yoshiyuki,Sekiguchi Atsushi,Fujiwara Koichi,Watanabe Tsuyoshi (Gary),Taira Kazuo,Kusumoto Shiro,Nakano Takanori,Shimokawa Tsutomu

Publisher

SPIE

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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