High Resolution Positive Photoresists-Reference-Cited by-同舟云学术

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High Resolution Positive Photoresists

Published:1986-07-09 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing III
language:
Short-container-title:

Author:

Hanabata M.¹,Furuta A.¹,Uemura Y.¹

Affiliation:

1. Sumitomo Chemical Co., Ltd. (Japan)

Publisher

SPIE

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Photopolymer Science and Technology Award;Journal of Photopolymer Science and Technology;2024-06-25

2. Application of ethyltrimethylammonium hydroxide (ETMAH) as an alternative developer solution/process for semiconductor lithography;Japanese Journal of Applied Physics;2021-02-22

3. Photolithography;Materials Science and Technology;2013-02-15

4. Prebake Temperature Dependence of Development Characteristics in the Positive-Tone Novolak Resist;KOBUNSHI RONBUNSHU;2012

5. Relationship Between the Development Temperature and the Resist Characteristic of the Positive-Tone Novolak Resist;KOBUNSHI RONBUNSHU;2012

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