Investigating the effect of ionizing radiation on the acid concentration necessary for dissolution of chemically amplified EUV photoresists-Reference-Cited by-同舟云学术

Investigating the effect of ionizing radiation on the acid concentration necessary for dissolution of chemically amplified EUV photoresists

Published:2018-03-28 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XXXV
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Author:

Grzeskowiak Steven,Kaminsky Jake,Chandonait Jonathan,Denbeaux Greg H.,Gibbons Sean,Welling Ulrich,Melvin Lawrence S.,Kandel Yudhishthir,Brainard Robert L.

Publisher

SPIE

Reference20 articles.

1. Microlithography · Molecular Imprinting

2. Radiation Chemistry in Chemically Amplified Resists

3. Polymer effects on PAG acid yield in EUV resists;Grzeskowiak,2018

4. Studying electron-PAG interactions using electron-induced fluorescence;Narasimhan,2016

5. Secondary Electrons in EUV Lithography

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