Study of electron-induced chemical transformations in model resists-Reference-Cited by-同舟云学术

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Study of electron-induced chemical transformations in model resists

Published:2023-11-21 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2023
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Author:

Mueller Maximillian W.,McAfee Terry R.,Naulleau Patrick P.,Oh Dahyun,Kostko Oleg

Publisher

SPIE

Reference12 articles.

1. Analytical techniques for mechanistic characterization of EUV photoresists

2. Effect of molecular weight on the EUV-printability of main chain scission type polymers;Rathore;J. Mater. Chem,2020

3. Polymer photochemistry at the EUV wavelength

4. Dissociative photoionization of EUV lithography photoresist models;Gentile,2023

5. Photo-electron chemistry of photoresist outgassing upon DUV, VUV, EUV, and BEUV irradiation

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of electron-induced chemical transformations in polymers;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-07-16

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