A novel patterning control strategy based on real-time fingerprint recognition and adaptive wafer level scanner optimization

Author:

Cekli Hakki Ergun,Nije Jelle,Ypma Alexander,Bastani Vahid,Sonntag Dag,Niesing Henk,Zhang Linmiao,Ullah Zakir,Subramony Venky,Somasundaram Ravin,Susanto William,Matsunobu Masazumi,Johnson Jeff,Tabery Cyrus,Lin Chenxi,Zou Yi

Publisher

SPIE

Reference5 articles.

1. Philippe Leray, “Metrology challenges for in-line process control”, Proc. of SPIE Vol. 10145 1014503.

2. Lee, H., et al, “Experimental verification of On-Product Overlay improvement by intra-lot overlay control using metrology based grouping”, Proc. of SPIE Vol. 10147 1014713.

3. The elements of statistical learning;Friedman,2009

4. Gkorou, D., et al, “Towards Big Data Visualization for Monitoring and Diagnostics of High Volume Semiconductor Manufacturing”, Proceedings of the Computing Frontiers Conference, Siena, Italy, pp. 338–342

5. Lam, A., et al, “Pattern recognition and data mining techniques to identify factors in wafer processing and control determining overlay error,” Proc. of SPIE 9424, id. 94241L.

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