Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond-Reference-Cited by-同舟云学术

Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

Published:2016-04-27 Issue:2 Volume:15 Page:021011
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Zine El Abidine Nacer¹,Sundermann Frank²,Yesilada Emek²,Farys Vincent²,Huguennet Frederic³,Armeanu Ana-Maria³,Bork Ingo⁴,Chomat Michael³,Buck Peter⁴,Schanen Isabelle⁵

Affiliation:

1. STMicroelectronics, 850, rue Jean Monnet, F 38926 Crolles Cedex, FrancebInstitut de Microélectronique, Electromagnétisme et Photonique–Laboratoire d’Hyperfréquences et Caractérisation, Minatec, 3 rue Parvis Louis Néel, CS 50257, 38016 Grenoble Cedex 1, Fr

2. STMicroelectronics, 850, rue Jean Monnet, F 38926 Crolles Cedex, France

3. Mentor Graphics Corporation, 110 Rue Blaise Pascal, 38330 Montbonnot-Saint-Martin, France

4. Mentor Graphics Corporation, 46871 Bayside Parkway Fremont, California 94538, United States

5. Institut de Microélectronique, Electromagnétisme et Photonique–Laboratoire d’Hyperfréquences et Caractérisation, Minatec, 3 rue Parvis Louis Néel, CS 50257, 38016 Grenoble Cedex 1, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC): Module 2. Lithography simulation based on optical mask writing tool simulation

2. Integrated mask and optics simulations for mask corner rounding effect in OPC modeling

3. Mask process effect aware OPC modeling

4. Three dimensional mask effects in OPC process model development from first principles simulation

5. Adjustment of optical proximity correction (OPC) software for mask process correction (MPC). Module 1: Optical mask writing tool simulation

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1. The role of model-based MPC in advanced mask manufacturing;33rd European Mask and Lithography Conference;2017-09-28