The future of EUV lithography: enabling Moore's Law in the next decade-Reference-Cited by-同舟云学术

The future of EUV lithography: enabling Moore's Law in the next decade

Published:2017-03-27 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Pirati Alberto¹,van Schoot Jan¹,Troost Kars¹,van Ballegoij Rob¹,Krabbendam Peter¹,Stoeldraijer Judon¹,Loopstra Erik¹,Benschop Jos¹,Finders Jo¹,Meiling Hans¹,van Setten Eelco¹,Mika Niclas¹,Dredonx Jeannot¹,Stamm Uwe¹,Kneer Bernhard²,Thuering Bernd²,Kaiser Winfried²,Heil Tilmann²,Migura Sascha²

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

2. Carl Zeiss SMT GmbH (Germany)

Publisher

SPIE

Reference15 articles.

1. The chips are down for Moore’s law;Mitchell Waldrop,2016

2. Moore, G.E., Electronics 38 (1965)

3. Moore, G. E. IEDM Tech. Digest 11–13 (1975).

4. Kurzweil, Ray, “The law of accelerating returns”, www.kurzweilai.net, March 2001

5. Tom Castenmiller at al., Towards ultimate optical lithography with NXT:1950i dual stage immersion platform, SPIE proceedings 7640, 2010

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