Author:
Rathsack Benjamen,Somervell Mark,Muramatsu Makato,Tanouchi Keiji,Kitano Takahiro,Nishimura Eiichi,Yatsuda Koichi,Nagahara Seiji,Iwaki Hiroyuki,Akai Keiji,Ozawa Mariko,Romo Negreira Ainhoa,Tahara Shigeru,Nafus Kathleen
Cited by
25 articles.
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1. Hexagonal arrays of contact holes with chemo-epitaxial DSA;Novel Patterning Technologies 2022;2022-05-25
2. Self-aligned double pattern process using DSA pattern;Advances in Patterning Materials and Processes XXXVIII;2021-02-22
3. Directed self-assembly of block copolymers for sub-10 nm fabrication;International Journal of Extreme Manufacturing;2020-08-12
4. Defect mitigation of chemo-epitaxy DSA patterns;Advances in Patterning Materials and Processes XXXVII;2020-03-23
5. Pattern defect reduction for chemo-epitaxy DSA process;Advances in Patterning Materials and Processes XXXVI;2019-03-25