Gradient-based source mask and polarization optimization with the hybrid Hopkins

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Gradient-based source mask and polarization optimization with the hybrid Hopkins–Abbe model

Published:2020-09-09 Issue:03 Volume:19 Page:
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Ding Ming¹,Niu Zhiyuan¹,Zhang Fang¹,Zhu Linglin¹,Shi Weijie²,Zeng Aijun¹,Huang Huijie¹

Affiliation:

1. Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, Laboratory of Informat

2. Dongfang Jingyuan Electron Ltd., Beijing

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. DMD digital lithography optimization based on a hybrid genetic algorithm and improved exposure model;Optics Express;2024-08-06

2. The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm;Applied Sciences;2023-05-05

3. Inverse Lithography Source Optimization via Particle Swarm Optimization and Genetic Combined Algorithm;IEEE Photonics Journal;2023-04

4. Global optimisation of source and mask in inverse lithography via tabu search combined with genetic algorithm;Optics Express;2022-06-21

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