Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond-Reference-Cited by-同舟云学术

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Alternating phase shift mask architecture scalability, implementations, and applications for 90-nm and 65-nm technology nodes and beyond

Published:2003-08-26 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Cheng Wen-Hao,Chakravorty Kishore K.,Farnsworth Jeff N.

Publisher

SPIE

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanotechnology;Nano- and Microfabrication for Industrial and Biomedical Applications;2016

2. Nanotechnology;Microfabrication for Industrial Applications;2011

3. Massively parallel fabrication of repetitive nanostructures: nanolithography for nanoarrays;Journal of Physics D: Applied Physics;2009-06-04

4. Second level printing of advanced phase shift masks using DUV laser lithography;SPIE Proceedings;2005-06-28

5. Second level exposure for phase shift mask applications using an SLM-based DUV mask writer;SPIE Proceedings;2005-06-28

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