Second level exposure for phase shift mask applications using an SLM-based DUV mask writer-Reference-Cited by-同舟云学术

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Second level exposure for phase shift mask applications using an SLM-based DUV mask writer

Published:2005-06-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Chandramouli Mahesh,Olshausen Bob,Korobko Yulia,Henrichs Sven,Qu Ping,Ma Jian,Auches Bruce,Cole Damon,Ostrom Thomas,Beyerl Angela,Eklund Robert,Zerne Raoul,Goransson Peter,Persson Magnus,Newman Tom

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improving the CD linearity and proximity performance of photomasks written on the Sigma7500-II DUV laser writer through embedded OPC;SPIE Proceedings;2007-10-05

2. Application of Sigma7500 pattern generator to X architecture and 45-nm generation mask making;SPIE Proceedings;2007-05-03

3. Embedded optical proximity correction for the Sigma7500 DUV mask writer;SPIE Proceedings;2007-05-03

4. Design for manufacturing approach to second level alternating phase shift mask patterning;SPIE Proceedings;2007-03-16

5. Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer;23rd European Mask and Lithography Conference;2007-02-08

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