Studies of acid diffusion in low Ea chemically amplified photoresists-Reference-Cited by-同舟云学术

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Studies of acid diffusion in low Ea chemically amplified photoresists

Published:2005-05-04 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wallraff G. M.,Medeiros D. R.,Larson C. E.,Sanchez M.,Petrillo Karen,Huang Wu-Song,Rettner C.,Davis B. W.,Sundberg Linda,Hinsberg William D.,Houle F. A.,Hoffnagle J. A.,Goldfarb Dario,Temple K.,Bucchignano J.

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 极紫外（EUV）光刻胶的研发;Laser & Optoelectronics Progress;2022

2. Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance;Macromolecules;2019-01-15

3. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016

4. Chemistry and processing of resists for nanolithography;Nanolithography;2014

5. Aqueous and solvent developed negative-tone molecular resists;SPIE Proceedings;2010-03-11

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