Intra-field patterning control using high-speed and small-target optical metrology of CD and focus-Reference-Cited by-同舟云学术

Intra-field patterning control using high-speed and small-target optical metrology of CD and focus

Published:2015-03-19 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Cramer Hugo,Petra Stefan,Fagginger Auer Bastiaan Onne,Smilde Henk-Jan,Wisse Baukje,Welch Steven,Kruijswijk Stefan,Hinnen Paul,Segers Bart,Leewis Christian,Staals Frank,Escalante Marun Maryana,Young Stuart,Guo Wei,den Boef Arie

Publisher

SPIE

Reference10 articles.

1. Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

2. Combined overlay, focus and CD metrology for leading edge lithography

3. Review of CD measurement and scatterometry;Thony,2003

4. High speed optical metrology solution for after etch process monitoring and control;Charley,2014

5. Scatterometry-based on-product focus measurement and monitoring

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