Enhanced methodology of focus control and monitoring on scanner tool-Reference-Cited by-同舟云学术

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Enhanced methodology of focus control and monitoring on scanner tool

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Chen Yen-Jen¹,Kim Young Ki¹,Hao Xueli¹,Gomez Juan-Manuel¹,Tian Ye²,Kamalizadeh Ferhad²,Hanson Justin K.²

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. ASML US, Inc. (United States)

Publisher

SPIE

Reference10 articles.

1. YieldStar: a New Metrology Platform for Advanced Lithography Control;Maas,2011

2. Combined Overlay, Focus and CD Metrology for leading Edge Lithography;Ebert,2011

3. Lithographic scanner stability improvements through advanced metrology and control;Vanoppen,2010

4. Improving on-product performance at litho using integrated diffraction-based metrology;Chen,2014

5. New approaches in diffraction based optical metrology;Ebert,2016

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