1. Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance;Hinsberg,1998
2. Enhanced, quantitative analysis of resist image contrast upon line edge roughness;Williamson,2003
3. Characterization of line edge roughness in photoresist using an image fading technique;Pawloski,2004
4. Effect of process parameters on pattern edge roughness of chemically-amplified resists;Koh,2000
5. Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions;Lin,2001