Defectivity decrease in the photolithography process by AMC level reduction through implementation of novel filtration and monitoring solutions-Reference-Cited by-同舟云学术

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Defectivity decrease in the photolithography process by AMC level reduction through implementation of novel filtration and monitoring solutions

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Pic Nicolas,Martin Christophe,Vitalis Michel,Calarnou Thierry,Camlay Daniel,Grosjean Catherine,Lanier Arnaud,Kames Jost,Acksel Alexander,Galvez Christophe

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of a detection system for gas-phase aromatics and other molecules ionizable by soft X-rays demonstrated using methyl salicylate;Aerosol Science and Technology;2023-04-27

2. Chemical metrology: a novel approach to measuring critical airborne molecular contamination in photolithography and track tools in real time;Metrology, Inspection, and Process Control XXXVI;2022-05-26

3. Real-time monitoring of acetic acid and PGMEA in a photolithographic multifunction chemical filter using a laser-based multi-species VOC analyzer;Metrology, Inspection, and Process Control XXXVI;2022-05-26

4. Real-time monitoring of critical AMC compounds in the photolithography cell using a novel laser-based, multi-species detection system;Metrology, Inspection, and Process Control XXXVI;2022-05-26

5. Monitoring of organic contamination in the ambient air of microelectronic clean room by proton-transfer reaction/time-of-flight/mass spectrometry (PTR–ToF–MS);International Journal of Mass Spectrometry;2015-12

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